<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE ArticleSet PUBLIC "-//NLM//DTD PubMed 2.7//EN" "https://dtd.nlm.nih.gov/ncbi/pubmed/in/PubMed.dtd">
<ArticleSet>
<Article>
<Journal>
				<PublisherName>Semnan University Press</PublisherName>
				<JournalTitle>Journal of Modeling and Simulation in Electrical and Electronics Engineering</JournalTitle>
				<Issn>2821-0786</Issn>
				<Volume>6</Volume>
				<Issue>2</Issue>
				<PubDate PubStatus="epublish">
					<Year>2026</Year>
					<Month>06</Month>
					<Day>01</Day>
				</PubDate>
			</Journal>
<ArticleTitle>Impact of Oxide Thickness on the Electrical and Analog/RF Performance of Strained Heterojunction Gate-All-Around Nanosheet FETs</ArticleTitle>
<VernacularTitle></VernacularTitle>
			<FirstPage>21</FirstPage>
			<LastPage>31</LastPage>
			<ELocationID EIdType="pii">10528</ELocationID>
			
<ELocationID EIdType="doi">10.22075/mseee.2026.40048.1242</ELocationID>
			
			<Language>EN</Language>
<AuthorList>
<Author>
					<FirstName>Reza</FirstName>
					<LastName>Abbasnezhad</LastName>
<Affiliation>Department of Electrical Engineering, Shabestar Branch, Islamic Azad University, Shabestar, Iran.</Affiliation>

</Author>
</AuthorList>
				<PublicationType>Journal Article</PublicationType>
			<History>
				<PubDate PubStatus="received">
					<Year>2025</Year>
					<Month>12</Month>
					<Day>13</Day>
				</PubDate>
			</History>
		<Abstract>In this paper, the quantitative assessment of Heterojunction Gate All Around Nanosheet Field Effect Transistor (Heterojunction GAA NS FET) and Conventional Gate All Around Nanosheet Field Effect Transistor (Conventional GAA NS FET) performance was evaluated for different oxide thicknesses ). The effect of electrostatic control on DC and designing analog circuits, such as transconductance generation factor (TGF), Early voltage ( ), output conductance ( ), transconductance ( ), cut off frequency have been investigated for all devices. Higher TGF and  was achieved with  for all devices. In the proposed Heterojunction GAA NS FET, we have used Germanium for the source region, Silicon/Germanium/Silicon (Si/Ge/Si) for the channel, and Silicon as the drain region. Incorporating strain in nanosheet and heterojunction structure devices can significantly improve device performance. Before using a model to analyz a semiconductor device, the model parameters must be accurately determined and elaborated. In this case, the Density Gradient (DG) equation, for a given electron Fermi-level distribution, has been solved self-consistently for the electrostatic potential, the Shockley-Read-Hall (SRH) equation for estimating carrier generation, bandgap narrowing for transport behavior and auger recombination. The general results show an improvement of approximately 10% in drain current, transconductance, and unity-gain frequency, providing superior RF performance of the heterojunction structure compared to the conventional GAA NS FET.</Abstract>
		<ObjectList>
			<Object Type="keyword">
			<Param Name="value">Nanosheet</Param>
			</Object>
			<Object Type="keyword">
			<Param Name="value">Heterojunction GAA NS FET</Param>
			</Object>
			<Object Type="keyword">
			<Param Name="value">Conventional GAA NS FET</Param>
			</Object>
			<Object Type="keyword">
			<Param Name="value">Density Gradient</Param>
			</Object>
			<Object Type="keyword">
			<Param Name="value">On-Off-state</Param>
			</Object>
		</ObjectList>
<ArchiveCopySource DocType="pdf">https://mseee.semnan.ac.ir/article_10528_219800b964a63cb41996e44b4eb10cd6.pdf</ArchiveCopySource>
</Article>
</ArticleSet>
